JPS5645127B2 - - Google Patents

Info

Publication number
JPS5645127B2
JPS5645127B2 JP2213374A JP2213374A JPS5645127B2 JP S5645127 B2 JPS5645127 B2 JP S5645127B2 JP 2213374 A JP2213374 A JP 2213374A JP 2213374 A JP2213374 A JP 2213374A JP S5645127 B2 JPS5645127 B2 JP S5645127B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2213374A
Other languages
Japanese (ja)
Other versions
JPS50117503A (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2213374A priority Critical patent/JPS5645127B2/ja
Priority to GB7921/75A priority patent/GB1490284A/en
Priority to US05/552,902 priority patent/US4028111A/en
Publication of JPS50117503A publication Critical patent/JPS50117503A/ja
Publication of JPS5645127B2 publication Critical patent/JPS5645127B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2213374A 1974-02-25 1974-02-25 Expired JPS5645127B2 (en])

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2213374A JPS5645127B2 (en]) 1974-02-25 1974-02-25
GB7921/75A GB1490284A (en) 1974-02-25 1975-02-25 Light-sensitive lithographic printing plate precursors
US05/552,902 US4028111A (en) 1974-02-25 1975-02-25 Light-sensitive lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2213374A JPS5645127B2 (en]) 1974-02-25 1974-02-25

Publications (2)

Publication Number Publication Date
JPS50117503A JPS50117503A (en]) 1975-09-13
JPS5645127B2 true JPS5645127B2 (en]) 1981-10-24

Family

ID=12074383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2213374A Expired JPS5645127B2 (en]) 1974-02-25 1974-02-25

Country Status (3)

Country Link
US (1) US4028111A (en])
JP (1) JPS5645127B2 (en])
GB (1) GB1490284A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4087584A (en) * 1975-10-31 1978-05-02 Ricoh Co., Ltd. Lithographic printing plate
DE2846256A1 (de) * 1977-10-24 1979-04-26 Fuji Photo Film Co Ltd Verfahren zur entwicklung positiv wirkender lichtempfindlicher planographischer druckplatten
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
GB2046931B (en) * 1979-02-27 1983-03-16 Fuji Photo Film Co Ltd Method of developing positive-acting photosensitive lithographic printing plate precursor
JPS55115045A (en) * 1979-02-27 1980-09-04 Fuji Photo Film Co Ltd Printing plate preparation
US4299906A (en) * 1979-06-01 1981-11-10 American Hoechst Corporation Light-sensitive color proofing film with surfactant in a light-sensitive coating
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
DE3268962D1 (en) * 1981-09-08 1986-03-20 Minnesota Mining & Mfg Lithographic substrate and its process of manufacture
US4822722A (en) * 1985-07-18 1989-04-18 Petrarch Systems, Inc. Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image
US4634652A (en) * 1985-07-25 1987-01-06 American Hoechst Corporation Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein
US4999274A (en) * 1987-02-02 1991-03-12 Nippon Paint Co., Ltd. Positive type photosensitive resinous composition with 1,2 quinone diazide sulfonyl unit
JP2608408B2 (ja) * 1987-05-13 1997-05-07 日本ペイント株式会社 ポジ型感光性樹脂組成物
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
US5188032A (en) * 1988-08-19 1993-02-23 Presstek, Inc. Metal-based lithographic plate constructions and methods of making same
US5210155A (en) * 1990-08-24 1993-05-11 Exxon Chemical Patents Inc. Phenol terminated diester compositions derived from dicarboxylic acids, polyester polymers or alkyd polymers, and curable compositions containing same
US5166289A (en) * 1990-12-19 1992-11-24 Exxon Chemical Patents Inc. Thermoset coating composition having improved hardness
US5242780A (en) * 1991-10-18 1993-09-07 Industrial Technology Research Institute Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
JP3156945B2 (ja) * 1993-03-24 2001-04-16 富士写真フイルム株式会社 リード・フレーム形成用材の作製方法
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US6491037B1 (en) 2001-10-10 2002-12-10 Daniel J. Mortenson Temperature indicating mouth guard
US6786155B2 (en) * 2002-04-26 2004-09-07 Kodak Polychrome Graphics Llc Dimensionally stable paper substrate for a precursor to an imaged member
DE602006009919D1 (de) 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
EP1972460B1 (en) * 2007-03-19 2009-09-02 Agfa Graphics N.V. A method for making a lithographic printing plate support
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
ES2365885T3 (es) * 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
EP3032334B1 (en) 2014-12-08 2017-10-18 Agfa Graphics Nv A system for reducing ablation debris
US20190079407A1 (en) 2016-03-16 2019-03-14 Agfa Nv Method and apparatus for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE508815A (en]) * 1949-07-23
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
BE506677A (en]) * 1950-10-31
NL130926C (en]) * 1959-09-04
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
BE757066A (fr) * 1969-10-03 1971-03-16 Eastman Kodak Co Composition photoconductrice contenant un sensibilisateur organique et procede electrophotographique utilisant cette composition pour former une image a contraste ameliore
NL165852C (nl) * 1970-09-29 1981-05-15 Hoechst Ag Werkwijze voor het vervaardigen van een reprografisch kopieermateriaal door een lichtgevoelige laag aan te brengen op een drager.
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition

Also Published As

Publication number Publication date
JPS50117503A (en]) 1975-09-13
GB1490284A (en) 1977-10-26
US4028111A (en) 1977-06-07

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